Sputtering of fullerene by noble gas ions at high fluences
Review articleOpen access

AbstractNoble gas ions have been implanted into fullerene in the solid state up to fluences which far exceed the molecular destruction threshold. The corresponding depth profile peaks in Rutherford backscattering experiments move strongly towards the surface signal with increasing fluence. This suggests a high degree of target erosion due to collisional sputtering. One consequence of this process can be an interesting and basic effect on the nature of the fullerene destruction products.

Request full text

References (0)

Cited By (0)

No reference data.
No citation data.
Join Copernicus Academic and get access to over 12 million papers authored by 7+ million academics.
Join for free!