Photo-oxidation of polystyrene—Part 3. Photo-oxidation of 2-phenyl butane as model compound for polystyrene
Review articleOpen access
Julia Lucki - No affiliation found
1979/11/01 Full-length article DOI: 10.1016/0141-3910(79)90001-6
Journal: Polymer Degradation and Stability
AbstractDuring the photo-oxidation of 2-phenyl butane as model compound for polystyrene the following compounds were isolated and identified: acetophenone, propiophenone, 2-phenyl-2-butanol, 2-phenyl-2-hydroxy-(3,4) butene, 2-hydroxy-acetophenone, 2-hydroxy-propiophenone; o-methyl (methyl-benzoate), 1-keto-1(2) hydroxy butyl-(2,4)hexadienoic acid methyl ester and 1-(2)hydroxy butyl-2-keto-butyrolactone.Mechanisms for the formation of these compounds have been proposed. Comparison of carbonyl group frequencies in the products of photo-oxidised 2-phenyl butane with corresponding frequencies in photo-oxidised polystyrene gives evidence of similar mechanisms of photo-oxidation.
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