Join Copernicus Academic and get access to over 12 million papers authored by 7+ million academics.

Related Articles:

• Photonic-crystal waveguide structure by pattern-integrated interference lithography.

• Generation of Customizable Micro-wavy Pattern through Grayscale Direct Image Lithography.

• Heterogeneous Charge-Transfer Nanorods by Strained Melt-Molding Lithography.

• Pulsed transfer etching of PS-PDMS block copolymers self-assembled in 193 nm lithography stacks.

• Transfer of Two-Dimensional Oligonucleotide Patterns onto Stereocontrolled Plasmonic Nanostructures Read more...

Fine pattern transfer by nanocasting lithography

Yoshihiko Hirai - No affiliation found

2005/03/01 Full-length article DOI: 10.1016/j.mee.2004.12.080 Journal: Microelectronic Engineering

Abstract:

AbstractA novel pattern transfer technique has been demonstrated by simple procedure based on a nanoimprint lithography. A polymer is coated on a mold by a spin coater and cast into fine grooves on the mold. After evaporation of a solvent, an adhesive resin is coated on the polymer and put a substrate plate. After releasing the mold, fine pattern is successfully transferred to the polymer. Applying this process, fine pattern transfer using various polymers, high aspect ratio pattern and sub-100 nm patterns have been demonstrated on various substrates.