Fine pattern transfer by nanocasting lithography
Review articleOpen access
Abstract:

AbstractA novel pattern transfer technique has been demonstrated by simple procedure based on a nanoimprint lithography. A polymer is coated on a mold by a spin coater and cast into fine grooves on the mold. After evaporation of a solvent, an adhesive resin is coated on the polymer and put a substrate plate. After releasing the mold, fine pattern is successfully transferred to the polymer. Applying this process, fine pattern transfer using various polymers, high aspect ratio pattern and sub-100 nm patterns have been demonstrated on various substrates.

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